Low temperature amorphous silicon channel material for polysilicon thin film transistors

Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 1270-1273

  Fulks, R T ^a   Ho, J ^a   Boyce, J B ^a   Davis, G A ^b   Aebi, V ^b  

^a PALO ALTO RESEARCH CENTER   (United States)

^b Intevac Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006307254     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00936-9     Document Type: Article

References (9)

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