Development of a 2.45 GHz electron cyclotron resonance ion source for ion-implanter application

Review of Scientific Instruments

Volumn 69, Issue 2, 1998, Pages 837-839

  Sekiguchi, M ^a   Matsushita, H ^b   Jonoshita, I ^b   Kabasawa, M ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b Sumitomo Eatron Nova Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006240539     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1148542     Document Type: Conference Paper

References (6)

1. R. Geller, Electron Cyclotron Resonance Ion Source and ECR Plasma (Institute of Physics, Bristol, 1996), Chap. 1.
2. R. Geller, Electron Cyclotron Resonance Ion Source and ECR Plasma (Institute of Physics, Bristol, 1996), Chap. 5.
3. L. Wartski, C. Schwebel, and J. Aubert, Rev. Sci. Instrum. RSINAK 67, 895 (1996).
4. K. Matsuda and M. Tanjyo, Rev. Sci. Instrum. RSINAK 67, 901 (1996).
5. M. Sekiguchi, Rev. Sci. Instrum. RSINAK 67, 1606 (1996).
6. R. Geller, Electron Cyclotron Resonance Ion Source and ECR Plasma (Institute of Physics, Bristol, 1996), 188.