Ion sources for implantation application (invited)

Review of Scientific Instruments

Volumn 67, Issue 3, 1996, Pages 901-904

  Matsuda, Koji ^a   Tanjyo, Masayasu ^a  

^a NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

ARSENIC IONS; BORON IONS; ION IMPLANTATION; ION SOURCES; MILLI AMP BEAM CURRENTS; MULTICHARGED IONS; PHOSPHORUS IONS; SILICON

Indexed keywords

EID: 0001082573     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1146833     Document Type: Conference Paper

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