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Volumn 3283, Issue , 1998, Pages 666-674

Polarization anisotropy in ordered GaInP optoelectronic devices

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ANISOTROPY; CRYSTAL SYMMETRY; ELECTROOPTICAL DEVICES; METALLORGANIC VAPOR PHASE EPITAXY; OPTOELECTRONIC DEVICES; TRANSISTORS;

EID: 0005872795     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.316718     Document Type: Conference Paper
Times cited : (1)

References (14)
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    • 0.5P grown by metalorganic vapor phase epitaxy and its relation to band-gap energy, Appl. Phys. Lett. 50, 673 (1987)
    • 0.5P grown by metalorganic vapor phase epitaxy and its relation to band-gap energy", Appl. Phys. Lett. 50, 673 (1987)
  • 2
    • 0039583734 scopus 로고    scopus 로고
    • 0.5P: An investigation using reflectance-difference spectroscopy, Phys. Rev. B 51, 7603 (1995)
    • 0.5P: An investigation using reflectance-difference spectroscopy", Phys. Rev. B 51, 7603 (1995)
  • 3
    • 21544462768 scopus 로고
    • Band-gap narrowing in ordered and disordered semiconductor alloys
    • S.H.Wei, A.Zunger, "Band-gap narrowing in ordered and disordered semiconductor alloys", Appl.Phys.Lett. 56, 662 (1990)
    • (1990) Appl.Phys.Lett , vol.56 , pp. 662
    • Wei, S.H.1    Zunger, A.2
  • 4
    • 33645040263 scopus 로고    scopus 로고
    • 0.48P, Phys.Rev.Lett. 63, 2108 (1989)
    • 0.48P", Phys.Rev.Lett. 63, 2108 (1989)
  • 6
    • 0028386173 scopus 로고
    • Optical anisotropy and spin polarization in ordered GaInP
    • S.-H. Wei, A. Zunger, "Optical anisotropy and spin polarization in ordered GaInP", Appl. Phys. Lett. 64, 1676 (1994)
    • (1994) Appl. Phys. Lett , vol.64 , pp. 1676
    • Wei, S.-H.1    Zunger, A.2
  • 9
    • 35949007792 scopus 로고
    • Optical properties of zinc-blende semiconductor alloys: Effects of epitaxial strain and atomic ordering
    • S.-H. Wei, A. Zunger, "Optical properties of zinc-blende semiconductor alloys: Effects of epitaxial strain and atomic ordering", Phys. Rev. B 49, 14337 (1994)
    • (1994) Phys. Rev. B , vol.49 , pp. 14337
    • Wei, S.-H.1    Zunger, A.2
  • 10
    • 57649115405 scopus 로고    scopus 로고
    • 2O = 1:8:160 shows an etch rate in (Al)GaAs of ≈230 nm/mm, and a selectivity (Al)GaAs:(Al)GaInP =100:1
    • 2O = 1:8:160 shows an etch rate in (Al)GaAs of ≈230 nm/mm, and a selectivity (Al)GaAs:(Al)GaInP =100:1
  • 13
    • 84975349908 scopus 로고    scopus 로고
    • 2O, J.Electrochem. Soc. 140, 844 (1993)
    • 2O", J.Electrochem. Soc. 140, 844 (1993)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.