Selective Wet Etching of Galnp, Gaas, and InP in Solutions of HCI, CH3COOH, and H2O2

Journal of the Electrochemical Society

Volumn 140, Issue 3, 1993, Pages 844-847

  Flemish, J R ^a   Jones, K A ^a  

^a U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

etching; gallium compounds; indium compounds; optoelectronic devices; oxidation

Indexed keywords

EID: 84975349908     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2056170     Document Type: Article

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