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Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 601-606

Deblocking reaction of chemically amplified positive DUV resists

(4) Yamana, Mitsuharu a Itani, Toshiro a Yoshino, Hiroshi a Tanabe, Hiroyoshi a

a NEC CORPORATION (Japan)

Author keywords

Chemically amplified ArF positive resists; Deblocking reaction; DUV lithography

Indexed keywords

EID: 0004875908 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.12.601 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.