Boron retarded self-interstitial diffusion in Czochralski growth of silicon crystals and its role in oxidation-induced stacking-fault ring dynamics

Applied Physics Letters

Volumn 75, Issue 11, 1999, Pages 1544-1546

  Sinno, Talid ^a   Susanto, Hendi ^a   Brown, Robert A ^a   Von Ammon, Wilfried ^b   Dornberger, Erich ^b  

^a USA   (United States)

^b SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004867823     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124749     Document Type: Article

References (19)

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