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Volumn 70, Issue 21, 1997, Pages 2867-2869

High peak-current-density strained-layer In0.3Ga0.7As/Al0.8Ga0.2As resonant tunneling diodes grown by metal-organic chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0004458212     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119027     Document Type: Article
Times cited : (17)

References (17)
  • 16
    • 8544263750 scopus 로고
    • Resonant Tunneling in Semiconductors
    • Plenum, New York
    • Resonant Tunneling in Semiconductors, NATO ASI Series B, edited by L. L. Chang, E. E. Mendez, and C. Tejedor (Plenum, New York, 1990), Vol. 277, pp. 201-211.
    • (1990) NATO ASI Series B , vol.277 , pp. 201-211
    • Chang, L.L.1    Mendez, E.E.2    Tejedor, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.