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Volumn , Issue , 2000, Pages 388-391

The 2.4F2 memory cell technology with stacked-surrounding gate transistor (S-SGT) DRAM

Author keywords

DRAM; S SGT; SGT; Three dimensional memory

Indexed keywords

CAPACITORS; COMPUTER SIMULATION; DIELECTRIC MATERIALS; PARAMETER ESTIMATION; SEMICONDUCTOR JUNCTIONS; THICKNESS MEASUREMENT;

EID: 0004393223     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (6)
  • 3
    • 0032156558 scopus 로고    scopus 로고
    • The analysis of the stacked-surrounding gate transistor (S-SGT) DRAM for the high speed and low voltage operation
    • T. Endoh, K. Shinmei, H. Sakuraba and F. Masuoka, "The analysis of the stacked-surrounding gate transistor (S-SGT) DRAM for the high speed and low voltage operation", IEICE Trans. Electron., vol. E81-C, No.9, p. 1491, 1998.
    • (1998) IEICE Trans. Electron. , vol.E81-C , Issue.9 , pp. 1491
    • Endoh, T.1    Shinmei, K.2    Sakuraba, H.3    Masuoka, F.4
  • 4
    • 0033115735 scopus 로고    scopus 로고
    • New three-dimensional memory array architecture for future ultrahigh-density DRAM
    • T. Endoh, K. Shinmei, H. Sakuraba and F. Masuoka, "New Three-Dimensional Memory Array Architecture for Future Ultrahigh-Density DRAM", IEEE J. Solid-State Circuits, vol. 34, No.4, pp. 476-483, 1999.
    • (1999) IEEE J. Solid-state Circuits , vol.34 , Issue.4 , pp. 476-483
    • Endoh, T.1    Shinmei, K.2    Sakuraba, H.3    Masuoka, F.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.