Tight-binding studies of the tendency for boron to cluster in c-Si. I. Development of an improved boron-boron model

Journal of Applied Physics

Volumn 84, Issue 5, 1998, Pages 2471-2475

  Rasband, Paul B ^a   Clancy, Paulette ^a   Roberts, Bruce W ^b,c  

^a School of Operations Research and Industrial Engineering   (United States)

^b Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

^c Starwave Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003370720     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368408     Document Type: Article

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