Scanning tunneling microscopy study of Si(111) surface morphology after removal of SiO2 by synchrotron radiation illumination

Applied Physics Letters

Volumn 76, Issue 11, 2000, Pages 1392-1394

  Gao, Y ^a,b   Mekaru, H ^a   Miyamae, T ^a,c   Urisu, T ^a  

^a INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^b UNIVERSITY OF ROCHESTER   (United States)

^c NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003176451     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126042     Document Type: Article

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