Effect of processing parameters on the chemistry of magnetron sputtered Ti-Al thin films

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 59-64

  Kale, A S ^a   Seal, S ^a   Beaulieu, K ^a   Sundaram, K B ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b University of Central Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROHARDNESS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; STRUCTURE (COMPOSITION); SURFACE CHEMISTRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER DEPTH PROFILING; HIGH TEMPERATURE CREEP; LIGHTWEIGHT MATERIALS; MICROHARDNESS MEASUREMENT; STRUCTURAL COATINGS; TITANIUM ALUMINUM ALLOYS;

TITANIUM ALLOYS;

EID: 0032591106     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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