New approach to 193-nm photoresists: Polyspironorbornane polymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 83-90

  Meagley, Robert P ^a   Park, Linus Y ^a   Frechet, Jean M J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

193 nm; Cage; Chemical amplification; Etch resistant; EUV; Lithography; Microelectronics; Norbornane; Photopolymer; Photoresist; Spiro

Indexed keywords

AMPLIFICATION; AMPLIFIERS (ELECTRONIC); ESTERS; FREE RADICAL POLYMERIZATION; FUNCTIONAL POLYMERS; HYDROCARBONS; MICROELECTRONICS; PHOTORESISTORS; POLYMERS; SURFACE TREATMENT; ULTRAVIOLET DEVICES;

193 NM; CAGE; CHEMICAL AMPLIFICATION; ETCH RESISTANT; EUV; NORBORNANE; SPIRO;

PHOTORESISTS;

EID: 0002878333     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312471     Document Type: Conference Paper

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