Advanced electron-beam pattern generation technology for 180 nm masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 19-27

  Abboud, Frank ^a   Sauer, Charles ^a   Wang, William ^a   Vernon, Matt ^a   Prior, Richard ^a   Pearce Percy, Henry ^a   Cole, Damon ^a   Mankos, Marian ^a  

^a Etec Systems Inc   (United States)

Author keywords

And closure; Butting; CD control; CD uniformity; Dry etch; Electron beam; MEBES 4500S; MPG

Indexed keywords

CONTROL THEORY; DATA STORAGE EQUIPMENT; DIRECTIONAL PATTERNS (ANTENNA); ELECTRONS; PHOTOLITHOGRAPHY; SECURITY OF DATA; TECHNOLOGY;

AND CLOSURE; BUTTING; CD CONTROL; CD UNIFORMITY; DRY ETCH; MEBES 4500S; MPG;

INTEGRATED OPTOELECTRONICS;

EID: 0002718834     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.301178     Document Type: Conference Paper

References (6)

1. Arnold, W., "Lithographic Strategies for sub-180 nm CMOS Device Fabrication," Photomask Japan '97.
2. th Annual Symposium on Photomask Technology and Management, SPIE vol 2884, pp. 19-27.
3. Abboud, F., "Multipass Gray Printing for New MEBES 4500S Mask Lithography," Photomask Japan '97.
4. Abboud, F., et al, "Evaluation of the MEBES 4500 Reticle Writer to Commercial Requirements of 250 nm Design Rule IC Devices," Photom9ask Japan '96.
5. Pearce-Percy, H., et al, "Optimization of Field-Emission Columns for Next Generation MEBES Systems," J. Vac. Sci. Technol., vol 15, Nov./Dec. 1997 (to be published).
6. th Annual Symposium on Photomask Technology and Management (to be published).