Benchmark study of mask writer lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 19-27

  Weins, Lawrence ^a   Smith, Wayne ^a  

^a SEMATECH   (United States)

Author keywords

Benchmark study; CD control; Mask; Mask writer; Overlay; Photomask; Registration; Throughput

Indexed keywords

DATA STORAGE EQUIPMENT; PHOTOMASKS; THROUGHPUT;

BENCHMARK STUDY; CD CONTROL; MASK WRITER; OVERLAY; REGISTRATION;

MASKS;

EID: 57949115762     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262813     Document Type: Conference Paper

References (2)

1. The National Technology Roadmap for Semiconductors, Semiconductor Industry Association (1994), p. 85
2. Ibid, p. 83