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Volumn 15, Issue 6, 1997, Pages 2754-2759

Optimization of field-emission columns for next-generation MEBES® systems

Author keywords

[No Author keywords available]

Indexed keywords


EID: 4143069276     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589721     Document Type: Article
Times cited : (3)

References (11)
  • 1
    • 4143058814 scopus 로고    scopus 로고
    • Multipass gray printing for new MEBES 4500S mask lithography system
    • paper unpublished
    • F. Abboud et al., "Multipass gray printing for new MEBES 4500S mask lithography system," paper at Photomask Japan Conference, 1997 (unpublished).
    • (1997) Photomask Japan Conference
    • Abboud, F.1
  • 2
    • 4143064370 scopus 로고    scopus 로고
    • F. Abboud et al., Proc. SPIE 2793, 438 (1996).
    • (1996) Proc. SPIE , vol.2793 , pp. 438
    • Abboud, F.1
  • 4
    • 0015435649 scopus 로고
    • Stuttgart
    • L. Veneklasen, Optik (Stuttgart) 81, 410 (1972).
    • (1972) Optik , vol.81 , pp. 410
    • Veneklasen, L.1
  • 8
  • 9
    • 0020717725 scopus 로고
    • Stuttgrat
    • J. Orloff, Optik (Stuttgrat) 63, 369 (1983).
    • (1983) Optik , vol.63 , pp. 369
    • Orloff, J.1
  • 11
    • 4143130677 scopus 로고    scopus 로고
    • US Patent No. 5, 196, 707 (23 March 1993)
    • M. Gesley, US Patent No. 5, 196, 707 (23 March 1993).
    • Gesley, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.