Highly Selective Photoresist Ashing by Addition of Ammonia to Plasma Containing Carbon Tetrafluoride

Journal of the Electrochemical Society

Volumn 148, Issue 2, 2001, Pages

  Saito, Makoto ^a,b   Eto, Hideo ^b   Omiya, Kayoko ^b   Homma, Tetsuya ^a   Nagatomo, Takao ^a  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002621020     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1339870     Document Type: Article

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