Novel type of highly photosensitive germanium-doped silica glass: Codoping with nitrogen

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2998, Issue , 1997, Pages 132-141

  Poulsen, Christian V ^a,b   Storgaard Larsen, Torben ^a,c   Hübner, Jörg ^a   Leistiko, Otto ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^c Bruel & Kjaer Danmark   (Denmark)

Author keywords

Germanosilicate; Opto micromechanical components; Photosensitivity; Plasma enhanced chemical vapor deposition

Indexed keywords

ELECTRODEPOSITION; GERMANIUM; GLASS; HYDROGEN; LIGHT SENSITIVE MATERIALS; MECHANICAL PROPERTIES; NITROGEN; NITROGEN OXIDES; NONMETALS; OPTICAL MATERIALS; PHOTOSENSITIVE GLASS; PHOTOSENSITIVITY; PLASMA DEPOSITION; PLASMAS; REFRACTIVE INDEX; SILANES; SILICA; VAPORS;

CHEMICAL VAPOR DEPOSITION PROCESSES; CO-DOPING; GERMANIA; GERMANOSILICATE; GLASS MATRICES; HYDROGEN LOADINGS; NITROUS OXIDE (N2O); OPTO-MICROMECHANICAL COMPONENTS; OXY-NITRIDES; SILICA GLASSES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0001971247     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.264174     Document Type: Conference Paper

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