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Volumn 74, Issue 1, 1999, Pages 40-42

Implications of a model for instability during film growth for strained InGaAs and SiGe layers

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001942516     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123126     Document Type: Article
Times cited : (21)

References (19)
  • 4
    • 22244460163 scopus 로고    scopus 로고
    • The nominal growth rates in these experiments was between 0.4 and 0.6 nm/s; private communication
    • The nominal growth rates in these experiments was between 0.4 and 0.6 nm/s; A. Ponchet (private communication).
    • Ponchet, A.1
  • 12
    • 22244437216 scopus 로고    scopus 로고
    • note
    • For an isotropic solid, there are two independent elastic moduli, which we take as the Young's modulus and the shear modulus. One limitation in our model is that the shear modulus is taken to be composition independent. This approach allows us to focus on the effects of compressions/extensions in the film, which compete with the lattice constant variation with composition.
  • 15
    • 0029703524 scopus 로고
    • in Evolution of Epitaxial Structure and Morphology, edited by, A. Zangwill, D. Jesson, D. Chambliss, and R. Clarke Materials Research Society, Pittsburgh, PA
    • J. E. Guyer and P. W. Voorhees, in Evolution of Epitaxial Structure and Morphology, edited by, A. Zangwill, D. Jesson, D. Chambliss, and R. Clarke, MRS Symposia Proceedings No. 399 (Materials Research Society, Pittsburgh, PA, 1995), pp. 351-357.
    • (1995) MRS Symposia Proceedings No. 399 , pp. 351-357
    • Guyer, J.E.1    Voorhees, P.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.