Evaluation of damage induced by inductively coupled plasma etching of 6H-SiC using Au Schottky barrier diodes

Applied Physics Letters

Volumn 73, Issue 5, 1998, Pages 653-655

  Li, Binghui ^a   Cao, Lihui ^a   Zhao, Jian H ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001688226     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121937     Document Type: Review

References (8)

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