Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmask

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1425-1427

  Choi, S H ^a   Wang, K L ^a   Leung, M S ^b   Stupian, G W ^b   Presser, N ^b   Chung, S W ^a   Markovich, G ^a   Kim, S H ^a   Heath, J R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b AEROSPACE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001664266     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581831     Document Type: Article

References (13)

1. A. P. Alivisatos, Science 271, 933 (1996).
2. L. F. Thompson, C. G. Willson, and M. J. Bowden, Introduction to Microlithography, ACS Symp. Series 219 (American Chemical Society, Washington DC, 1983).
3. M. A. McCord and R. F. W. Pease, J. Vac. Sci. Technol. B 4, 86 (1996).
4. P. I. Majundar, J. P. Oden, L. A. Carrejo, J. I. Nagahara, and J. Alexander, Appl. Phys. Lett. 61, 2293 (1992).
5. T. H. P. Chang, D. P. Kern, E. Kratschmer, K. Y. Lee, H. E. Luhn, M. A. McCord, S. A. Rishton, and Y. Vladimirsky, IBM J. Res. Dev. 32, 462 (1988).
6. R. W. Zehner, W. A. Lopes, T. L. Morkved, H. Jaeger, and L. R. Sita, Langmuir 14, 242 (1998).
7. C. B. Murray, D. J. Norris, and M. G. Bawendi, J. Am. Chem. Soc. 115, 8706 (1993).
8. M. Brust, M. Walker, D. Bethell, D. J. Schiffrin, and R. Whyman, J. Chem. Soc. Chem. Comm. 801 (1994).
9. C. B. Murray, C. R. Kagan, and M. G. Bawendi, Science 270, 1335 (1995).
10. S. W. Chung, G. Markovich, and J. R. Heath, J. Phys. Chem. B 102, 6685 (1998).
11. J. R. Heath, C. M. Knobler, and D. V. Leff, J. Phys. Chem. B 101, 189 (1997).
12. R. P. Sear, S. W. Chung, G. Markovich, W. M. Gelbart, and J. R. Heath (submitted).
13. J. I. Godstein, D. E. Newbury, P. Echlin, D. C. Joy, C. Fiori, and E. Lifshin, Scanning Electron Microscopy and X-Ray Microanalysis (Plenum, New York, 1981), p. 83.