Dielectric cracking produced by electromigration in microelectronic interconnects

Journal of Applied Physics

Volumn 88, Issue 11, 2000, Pages 6302-6312

  Chiras, S ^a   Clarke, D R ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001613321     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289044     Document Type: Article

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