Full-chip optical proximity correction with depth of focus enhancement

Microlithography World

Volumn 6, Issue 3, 1997, Pages 5-6,-8,-10,-13

  Chen, J Fung ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Caldwell, Roger ^a  

^a MicroUnity Systems Engineering Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; LOGIC CIRCUITS; MASKS; MICROPROCESSOR CHIPS; TRANSISTORS;

DEPTH OF FOCUS (DOF); OPTICAL PROXIMITY CORRECTION (OPC);

LITHOGRAPHY;

EID: 0031166124     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)