Room-temperature copper etching based on a plasma-copper reaction

Applied Physics Letters

Volumn 78, Issue 7, 2001, Pages 1002-1004

  Kuo, Yue ^a   Lee, Sangheon ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001568597     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1347388     Document Type: Article

References (8)

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7. Y. Kuo and S. Lee, Jpn. J. Appl. Phys., Part 2 39, L188 (2000).
8. In CRC Handbook of Chemistry and Physics, 81st edition, edited by D. R. Lide (CRC Press, Boca Raton, FL, 2000).