Low-level copper concentration measurements in silicon wafers using trace-element accelerator mass spectrometry

Applied Physics Letters

Volumn 72, Issue 23, 1998, Pages 3008-3010

  McDaniel, F D ^a   Datar, S A ^a   Guo, B N ^a   Renfrow, S N ^a   Zhao, Z Y ^b   Anthony, J M ^c  

^a UNIVERSITY OF NORTH TEXAS   (United States)

^b VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001519174     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121523     Document Type: Article

References (13)

1. R. A. Muller, Science 196, 480 (1977).
2. K. H. Purser, R. B. Liebert, A. E. Litherland, R. P. Beukens, H. E. Gove, C. L. Bennett, M. R. Glover, and W. E. Sondheim, Rev. Appl. Phys. 12, 1487 (1977).
3. D. Elmore and F. M. Phillips, Science 236, 543 (1987).
4. J. R. Davis, A. Rohatgi, R. H. Hopkins, P. D. Blais, P. Rai-Choudhury, J. R. McCormick, and H. C. Mollenkopf, IEEE Trans. Electron. Devices ED-27, 677 (1980).
5. J. M. Anthony, D. J. Donahue, and T. H. Zabel, Nucl. Instrum. Methods Phys. Res. B 10/11, 498 (1985).
6. F. D. McDaniel, J. M. Anthony, J. F. Kirchhoff, D. K. Marble, Y. D. Kim, S. N. Renfrow, E. C. Grannan, E. R. Reznik, G. Vizkelethy, and S. Matteson, Nucl. Instrum. Methods Phys. Res. B 89, 242 (1994).
7. J. F. Kirchhoff, D. K. Marble, D. L. Weathers, F. D. McDaniel, S. Matteson, J. M. Anthony, R. L. Beavers, and T. J. Bennett, Rev. Sci. Instrum. 65, 1570 (1994).
8. R. G. Wilson, F. A. Stevie, and C. W. Magee, Secondary Ion Mass Spectrometry (Wiley, New York, 1989).
9. D. L. Weathers, F. D. McDaniel, S. Matteson, J. L. Duggan, J. M. Anthony, and M. A. Douglas, Nucl. Instrum. Methods Phys. Res. B 56/57, 889 (1991).
10. W. Vandervorst and F. R. Shepherd, J. Vac. Sci. Technol. A 5, 313 (1987).
11. S. A. Datar, S. N. Renfrow, J. M. Anthony, and F. D. McDaniel, Mater. Res. Soc. Symp. Proc. 406, 395 (1996).
12. S. A. Datar, S. N. Renfrow, B. N. Guo, J. M. Anthony, Z. Y. Zhao, and F. D. McDaniel, Nucl. Instrum. Methods Phys. Res. B 123, 571 (1997).
13. J. C. C. Tsai, in VLSI Technology, edited by S. M. Sze (McGraw-Hill, New York, 1988), p. 293.