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Volumn 83, Issue 16, 1999, Pages 3234-3237
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Geometric frustration of 2d dopants in silicon: Surpassing electrical saturation
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001503735
PISSN: 00319007
EISSN: 10797114
Source Type: Journal
DOI: 10.1103/PhysRevLett.83.3234 Document Type: Article |
Times cited : (30)
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References (24)
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