Resolution improvement with annular illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1674, Issue , 1992, Pages 753-764

  Tounai, Keiichiro ^a   Tanabe, Hiroyoshi ^a   Nozue, Hiroshi ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SOURCES; PHOTORESISTS;

ANNULAR ILLUMINATION; ILLUMINATION METHOD; OPTICAL PARAMETER; PATTERN DEFORMATION; PATTERN PERIODICITY; RESOLUTION CAPABILITY; RESOLUTION IMPROVEMENT; SIMULATION ANALYSIS;

DEFORMATION;

EID: 85075599783     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.130365     Document Type: Conference Paper

References (5)

1. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, "Improving resolution in photolithography with a phase-shifting mask", IEEE Trans. Electron Devices, Vol. ED-29, pp. 1828-1836, 1982.
2. T. Terasawa, N. Hasegawa, T. Kurosaki, T. Tanaka, "0.3-micron optical lithography using a phase-shifting mask", SPIE Vol. 1088 Optical/Laser Microlithography II p. 25, 1989.
3. T. Ohfuji, M. Soenosawa, H. Nozue, K. Kasama, "Simulation analysis of Deep-UV chemically amplified resist", SPIE Vol. 1463 Optical/Laser Microlithography IV p. 345, 1991.
4. D. L. Fehrs, H. B. Lovering, R. T. Scruton, "Illuminator modification of an optical aligner", KTI Microelectronics seminar, p. 217, 1989.
5. For example; M. Born and E. Wolf, "Principles of Optics", Pergamon press.