Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment

Applied Physics Letters

Volumn 73, Issue 20, 1998, Pages 2953-2955

  Kim, Jong Kyu ^a   Lee, Jong Lam ^a   Lee, Jae Won ^b   Eoi Shin, Hyun ^b   Jo Park, Yong ^b   Kim, Taeil ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001387374     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122641     Document Type: Article

References (9)

1. S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyoku, Y. Sugimoto, T. Kozaki, H. Umemoto, M. Sano, and K. Chocho, Appl. Phys. Lett. 72, 2014 (1998).
2. J. S. Foresi and T. D. Moustakas, Appl. Phys. Lett. 62, 2859 (1993).
3. M. E. Lin, Z. Ma, F. Y. Huang, Z. F. Fan, L. H. Allen, and H. Morkoç, Appl. Phys. Lett. 64, 1003 (1994).
4. Z. Fan, S. Mohammad, and W. Kim, Appl. Phys. Lett. 68, 1672 (1996).
5. T. Mori, T. Kozawa, T. Ohwaki, Y. Yaga, S. Nagai, S. Yamasaki, S. Asami, N. Shibata, and M. Koike, Appl. Phys. Lett. 69, 3537 (1996).
6. J. T. Trexler, S. J. Pearton, P. H. Holloway, M. G. Mier, K. R. Evans, and R. F. Karlicek, Mater. Res. Soc. Symp. Proc. 449, 1091 (1997).
7. W. E. Spicer, Z. L. Weber, N. Newman, T. Kendelewieg, R. Cao, C. McCant, P. Mahowald, K. Miyano, and I. Lindau, J. Vac. Sci. Technol. B 6, 1245 (1988).
8. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy (Perkin-Elmer, Eden Prairie, MN, 1992).
9. K. Hattori and Y. Izumi, J. Appl. Phys. 53, 6906 (1982).