Influence of hydrogen dilution and substrate temperature in hot-wire deposition of amorphous and microcrystalline silicon with filament temperatures between 1900 and 2500°C

Materials Research Society Symposium - Proceedings

Volumn 420, Issue , 1996, Pages 357-362

  Conde, J P ^a   Brogueira, P ^a   Castanha, R ^a   Chu, V ^a  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGEN; OPTICAL PROPERTIES; RAMAN SPECTROSCOPY; SILANES; THERMAL EFFECTS; THIN FILMS; TUNGSTEN;

HOT WIRE DEPOSITION; HYDROGEN DILUTION; MICROCRYSTALLINE FILMS; SUBSTRATE TEMPERATURE; TUNGSTEN FILAMENTS;

AMORPHOUS FILMS;

EID: 0030394254     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-420-357     Document Type: Conference Paper

References (12)