Scatterometry for 0.24-0.70 um developed photoresist metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2439, Issue , 1995, Pages 427-436

  Murnane, Michael R ^a   Raymond, Christopher J ^a   Prins, Steven L ^a   Naqvi, S Sohail H ^a   McNeil, John R ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSION MEASUREMENT; MULTI-PARAMETER PREDICTION ALGORITHM; PHOTORESIST METROLOGY; SCATTEROMETRIC LINEWIDTH MEASUREMENT;

LIGHT SCATTERING; MEASUREMENTS; PHOTORESISTS; PROCESS CONTROL; SIGNAL FILTERING AND PREDICTION;

PHOTOLITHOGRAPHY;

EID: 0029422903     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)