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Journal of Nuclear Materials

Volumn 283-287, Issue PART II, 2000, Pages 1116-1120

Development of functionally graded plasma-facing materials

(9) Ge, Chang Chun a Li, Jiang Tao a Zhou, Zhang Jian a Cao, Wen Bin a Shen, Wei Ping a Wang, Ming Xu b Zhang, Nian Man b Liu, Xiang b Xu, Zheng Yu b

a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING (China)

b INSTITUTE OF NUCLEAR PHYSICS AND CHEMISTRY (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001208379 PISSN: 00223115 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3115(00)00318-4 Document Type: Article

Times cited : (40)

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