Laser-induced chemical vapour deposition of Si/C/H materials from monoorganylsilanes

Journal of Materials Chemistry

Volumn 6, Issue 2, 1996, Pages 155-160

  Pola, Josef ^a,d   Bastl, Zdenìk ^b   Šubrt, Jan ^c   Abeysinghe, J Rasika ^a   Taylor, Roger ^a  

^a UNIVERSITY OF SUSSEX   (United Kingdom)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^d INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000761796     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/JM9960600155     Document Type: Article

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