Effect of heavy boron doping on the lattice strain around platelet oxide precipitates in Czochralski silicon wafers

Journal of Applied Physics

Volumn 88, Issue 1, 2000, Pages 503-507

  Yonemura, Mitsuharu ^a   Sueoka, Koji ^a   Kamei, Kazuhito ^a  

^a Sumitomo Metal Industries Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001188573     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373686     Document Type: Article

References (20)

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