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Volumn 347, Issue , 1997, Pages 293-302

Heat transfer in horizontal and vertical CVD reactors

Author keywords

[No Author keywords available]

Indexed keywords


EID: 4143147232     PISSN: 02725673     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (9)

References (25)
  • 1
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    • Fotiadis, D. I., A. M. Kremer, D. R. McKenna, and K. F. Jensen, 1987, "Complex Flow Phenomena in Vertical MOCVD Reactors: Effects on Deposition Uniformity and Interface Abruptness," Journal of Crystal Growth, Vol. 85, pp. 154-164.
    • (1987) Journal of Crystal Growth , vol.85 , pp. 154-164
    • Fotiadis, D.I.1    Kremer, A.M.2    McKenna, D.R.3    Jensen, K.F.4
  • 2
    • 0025401662 scopus 로고
    • Flow and Heat Transfer in CVD Reactors: Comparison of Raman Temperature Measurements and Finite Element Model Predictions
    • Fotiadis, D. I., M. Boekholt, K. F. Jensen, and W. Richter, 1990a, "Flow and Heat Transfer in CVD Reactors: Comparison of Raman Temperature Measurements and Finite Element Model Predictions," Journal of Crystal Growth, Vol. 100, pp. 577-599.
    • (1990) Journal of Crystal Growth , vol.100 , pp. 577-599
    • Fotiadis, D.I.1    Boekholt, M.2    Jensen, K.F.3    Richter, W.4
  • 3
    • 0025430104 scopus 로고
    • Transport Phenomena in Vertical Reactors for Metalorganic Vapor Phase Epitaxy
    • Fotiadis, D. I., S. Kieda, and K. F. Jensen, 1990b, "Transport Phenomena in Vertical Reactors for Metalorganic Vapor Phase Epitaxy," Journal of Crystal Growth, Vol. 102, pp. 441-470.
    • (1990) Journal of Crystal Growth , vol.102 , pp. 441-470
    • Fotiadis, D.I.1    Kieda, S.2    Jensen, K.F.3
  • 5
    • 0020099234 scopus 로고
    • Gas Flow Patterns in Horizontal , Epitaxial Reactor Cells Observed by Interference Hologra- Phy
    • Giling, L. J., 1982, "Gas Flow Patterns in Horizontal , Epitaxial Reactor Cells Observed by Interference Hologra-phy," Journal of the Electrochemical Society, Vol. 129, n. 3, pp. 634-644.
    • (1982) Journal of the Electrochemical Society , vol.129 , Issue.3 , pp. 634-644
    • Giling, L.J.1
  • 6
    • 0024304808 scopus 로고
    • Effect of Buoyancy Forces and Reactor Orientation on Fluid Flow and Growth Rate Uniformity in Cold-Wall Channel CVD Reactors
    • Holstein, W. L. and J. L. Fitzjohn, 1989, "Effect of Buoyancy Forces and Reactor Orientation on Fluid Flow and Growth Rate Uniformity in Cold-Wall Channel CVD Reactors," Journal of Crystal Growth, Vol. 94, pp. 145-158.
    • (1989) Journal of Crystal Growth , vol.94 , pp. 145-158
    • Holstein, W.L.1    Fitzjohn, J.L.2
  • 10
    • 84998674966 scopus 로고
    • Three-Dimensional Mixed Convection in a Chemical Vapor Deposition Reactor
    • Karki, K. C., P. S. Sathyamurthy, and S. V. Patankar, 1993, "Three-Dimensional Mixed Convection in a Chemical Vapor Deposition Reactor," Journal of Heat Transfer, Vol. 115, pp. 803-806.
    • (1993) Journal of Heat Transfer , vol.115 , pp. 803-806
    • Karki, K.C.1    Sathyamurthy, P.S.2    Patankar, S.V.3
  • 11
    • 0002215675 scopus 로고    scopus 로고
    • Transport Phenomena in Chemical Vapor-Deposition Systems
    • Academic Press, Inc.
    • Mahajan, R. L., 1996, "Transport Phenomena in Chemical Vapor-Deposition Systems," In Advances in Heat Transfer, Vol. 28, pp. 339-425, Academic Press, Inc.
    • (1996) Advances in Heat Transfer , vol.28 , pp. 339-425
    • Mahajan, R.L.1
  • 12
    • 0026205351 scopus 로고
    • Buoyancy, Soret, Dufour, and Variable Property Effects in Silicon Epitaxy
    • Mahajan, R. L. and C. Wei, 1991, "Buoyancy, Soret, Dufour, and Variable Property Effects in Silicon Epitaxy," Journal of Heat Transfer, Vol. 113, pp. 688-695.
    • (1991) Journal of Heat Transfer , vol.113 , pp. 688-695
    • Mahajan, R.L.1    Wei, C.2
  • 13
    • 0001522504 scopus 로고
    • Complex Flow Phenomena in MOCVD Reactors - I. Horizontal Reactors
    • Moffat, H. and K. F. Jensen, 1986, "Complex Flow Phenomena in MOCVD Reactors - I. Horizontal Reactors," Journal of Crystal Growth, Vol. 77, pp. 108-119.
    • (1986) Journal of Crystal Growth , vol.77 , pp. 108-119
    • Moffat, H.1    Jensen, K.F.2
  • 14
    • 0023964157 scopus 로고
    • Three-Dimensional Flow Effects in Silicon CVD in Horizontal Reactors
    • Moffat, H. K. and K. F. Jensen, 1988, "Three-Dimensional Flow Effects in Silicon CVD in Horizontal Reactors," Journal of the Electrochemical Society, Vol. 135, pp. 459-471.
    • (1988) Journal of the Electrochemical Society , vol.135 , pp. 459-471
    • Moffat, H.K.1    Jensen, K.F.2
  • 15
    • 0024071873 scopus 로고
    • On the 2D Modelling of Horizontal CVD Reactors and its Limitations
    • Ouazzani, J., K. C. Chiu, and F. Rosenberger, 1988, "On the 2D Modelling of Horizontal CVD Reactors and its Limitations," Journal of Crystal Growth, Vol. 91, pp. 497-508.
    • (1988) Journal of Crystal Growth , vol.91 , pp. 497-508
    • Ouazzani, J.1    Chiu, K.C.2    Rosenberger, F.3
  • 16
    • 0025399692 scopus 로고
    • Three-Dimensional Modelling of Horizontal Chemical Vapor Deposition - I. MOCVD at Atmospheric Pressure
    • Ouazzani, J. and F. Rosenberger, 1990, "Three-Dimensional Modelling of Horizontal Chemical Vapor Deposition - I. MOCVD at Atmospheric Pressure," Journal of Crystal Growth, Vol. 100, pp. 545-576.
    • (1990) Journal of Crystal Growth , vol.100 , pp. 545-576
    • Ouazzani, J.1    Rosenberger, F.2
  • 18
  • 21
    • 0021866196 scopus 로고
    • Numerical Recirculating Flow Calculation using a Body-Fitted Coordinate System
    • Shyy, W., S. S. Tong, and S. M. Correa, 1985, "Numerical Recirculating Flow Calculation using a Body-Fitted Coordinate System," Numerical Heat Transfer, Vol. 8, pp. 99-113.
    • (1985) Numerical Heat Transfer , vol.8 , pp. 99-113
    • Shyy, W.1    Tong, S.S.2    Correa, S.M.3
  • 23
    • 0000530307 scopus 로고
    • Vertical Versus Horizontal Reactor: An Optical Study of the Gas Phase in a MOCVD Reactor
    • Stock, L. and W. Richter, 1986, "Vertical Versus Horizontal Reactor: An Optical Study of the Gas Phase in a MOCVD Reactor," Journal of Crystal Growth, Vol. 77, pp. 144-150.
    • (1986) Journal of Crystal Growth , vol.77 , pp. 144-150
    • Stock, L.1    Richter, W.2
  • 25
    • 0001726894 scopus 로고
    • The Application of Holographic Interferometry to the Visualization of Flow and Temperature Profiles in a MOCVD Reactor Cell
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    • (1986) Journal of Crystal Growth , vol.77 , pp. 128-135
    • Williams, J.E.1    Peterson, R.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.