Continuously moving finite thickness susceptor in CVD processing

American Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD

Volumn 361-364, Issue 4, 1998, Pages 209-219

  Chiu, Wilson K S ^a   Jaluria, Yogesh ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; HEAT TRANSFER; MASS TRANSFER; MATHEMATICAL MODELS; SURFACE PHENOMENA; THERMAL DIFFUSION IN SOLIDS;

CONTINUOUSLY MOVING FINITE THICKNESS SUSCEPTOR;

CHEMICAL VAPOR DEPOSITION;

EID: 0346384606     PISSN: 02725673     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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