The effects of microstructural transitions at width transitions on interconnect reliability

Journal of Applied Physics

Volumn 87, Issue 12, 2000, Pages 8467-8472

  Hau Riege, C S ^a   Thompson, C V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001110437     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373565     Document Type: Article

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