Automated interference lithography systems for generation of sub-micron feature size patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3879, Issue , 1999, Pages 124-135

  Hobbs, Douglas S ^a   MacLeod, Bruce D ^a   Kelsey, Adam F ^a   Leclerc, Mark A ^a   Sabatino III, Ernie ^a   Resler, Daniel P ^a  

^a Holographic Lithography Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; DIFFRACTION GRATINGS; DISTRIBUTED FEEDBACK LASERS; HOLOGRAPHIC INTERFEROMETRY; LIGHT INTERFERENCE; LIQUID CRYSTAL DISPLAYS; PHOTORESISTS;

FIELD EMISSION DISPLAYS; INTERFERENCE LITHOGRAPHY; MOTHEYE; SUBWAVELENGTH STRUCTURES;

LITHOGRAPHY;

EID: 0033352975     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)