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Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 684-689

Damage and contamination free fabrication of thin Si wires with highly controlled feature size

(4) Shinada, Takahiro a Kimura, Hiroaki a Kumura, Yoshinori a Ohdomari, Iwao a

a WASEDA UNIVERSITY (Japan)

Author keywords

Anisotropic etching; FIB; Hydrazine; SIMOX; Single ion implantation

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY OF SOLIDS; ETCHING; HYDRAZINE; ION BEAMS; ION IMPLANTATION; MASKS; SEMICONDUCTOR GROWTH; SILICA; SILICON WAFERS; WATER;

SEPARATION BY IMPLANTED OXYGEN (SIMOX); SINGLE ION IMPLANTATION;

SEMICONDUCTOR QUANTUM WIRES;

EID: 0031548271 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80164-X Document Type: Article

Times cited : (2)

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