Contamination of silicon during ion-implantation and annealing

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 407-410

  Liu, Xiao ^a   Pohl, R O ^a   Asher, Sally ^b   Crandall, R S ^b  

^a Department of Population Medicine and Diagnostic Sciences   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

Contamination; Ion implantation and annealing; Silicon

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CONTAMINATION; INTERNAL FRICTION; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY;

INTERNAL FRICTION MEASUREMENT;

SEMICONDUCTING SILICON;

EID: 0032064321     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00175-6     Document Type: Article

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