Slip-free processing of 300 mm silicon batch wafers

Journal of Applied Physics

Volumn 87, Issue 3, 2000, Pages 1543-1549

  Fischer, A ^a   Richter, H ^a   Kurner W ^b   Kucher P ^b  

^a IHP   (Germany)

^b Semiconductor300   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000904648     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372047     Document Type: Article

References (23)

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