Current status of X-ray mask manufacturing at the Microlithographic Mask Development Center

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 176-187

  Kimmel, Kurt R ^a   Hughes, Patrick J ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Microlithographic mask development center; Mmd; X ray lithography; X ray mask

Indexed keywords

BORON CARBIDE; DEFECTS; IMAGE ENHANCEMENT; MASKS; PHOTOMASKS; SILICON CARBIDE; SUBSTRATES; X RAY LITHOGRAPHY;

ENGINEERING CHALLENGES; MANUFACTURING ENVIRONMENTS; MICROLITHOGRAPHIC MASK DEVELOPMENT CENTER; OPERATIONAL TECHNIQUES; PROXIMITY X-RAY LITHOGRAPHIES; SILICON CARBIDE SUBSTRATES; STATE-OF-THE-ART EQUIPMENTS; X RAY MASK;

X RAYS;

EID: 0010403343     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245250     Document Type: Conference Paper

References (8)

1. Kurt R. Kimmel and Patrick J. Hughes, "X-ray mask fabrication advancements at the Microlithographic Mask Development Center", Proceedings of SPIE, Vol. 2723, in printing, 1996.
2. Denise Puisto, Mark Lawliss, Tom Faure, Janet Rocque, Kurt Kimmel, and Doug Benoit, "X-ray mask image-placement studies at the Microlithographic Mask Development Center", Proceedings of SPifi, Vol. 2723, in printing, 1996.
3. Denise Puisto, Mark Lawliss, and Mans Sturans, "Overlay enhancement with product-specific emulation in electron beam lithography tools", Journal of Vacuum Science and Technology B, Vol. 12, No. 6, pp. 3436-3439, 1994.
4. James D. Rockrohr, Rainer Butsch, William Enichen, Michael S. Gordon, Timothy R. Groves, John G. Hartley, and Hans C. Pfeiffer, "Performance ofIBM's EL-4 e-beam lithography system", Proceedings of SPW, Vol. 2437, pp. 1 60-1 67, 1995.
5. S. Aya, K. Marumoto, H. Yabe, and Y. Matsui, "Improvement of pattern and position accuracies by multiple electron beam writing for X-ray mask fabrication", Japan Journal of Applied Physics, Part 2, Vol. 32, 11 B pp. L1707-LL1710, Nov. 15, 1993.
6. S.C. Nash and T. B. Faure, "X-ray Mask Process-Induced Distortion Study", Journal of Vacuum Science and Technology B, Vol. 9, No. 6 pp. 3324-3328. 1991.
7. K.P. Muller, N.K. Eib, and T.B. Faure, "Etching on silicon membranes for sub-0.25-p.m X-ray mask manufacturing", Journal of Vacuum Science and Technology B, Vol. 11, No. 6, pp. 2270-2274, 1993.
8. SMIF (Standard Mechanical InterFace) is a SEMI standard. SMIF compatible product transport and storage pods referred to here are manufactured by Asyst Technologies, Inc.