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Volumn 138-139, Issue 1-4, 1999, Pages 581-586

The oxidation of surface layers during reactive ion etching of GaAs in CF 2 Cl 2 + O 2 and O 2 plasmas

Author keywords

Ion etching; Plasma; Surface layer

Indexed keywords


EID: 0000794398     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00530-3     Document Type: Article
Times cited : (4)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.