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Volumn 138-139, Issue 1-4, 1999, Pages 581-586
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The oxidation of surface layers during reactive ion etching of GaAs in CF 2 Cl 2 + O 2 and O 2 plasmas
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Author keywords
Ion etching; Plasma; Surface layer
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Indexed keywords
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EID: 0000794398
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(98)00530-3 Document Type: Article |
Times cited : (4)
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References (15)
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