-
1
-
-
0004932883
-
X-ray interactions: Photoabsorption, scattering, transmission, and reflec tion at E = 50-30, 000 eV, Z = 1-92
-
B. L. Henke, E. M. Gullikson, and J. C. Davis, “X-ray interactions: photoabsorption, scattering, transmission, and reflec tion at E = 50-30, 000 eV, Z = 1-92, ” in Atom. Data Nucl. Data Tab. 54, 181-342 (1993); optical constant files are available at www.cxro.lbl.gov.
-
(1993)
Atom. Data Nucl. Data Tab
, vol.54
, pp. 181-342
-
-
Henke, B.L.1
Gullikson, E.M.2
Davis, J.C.3
-
2
-
-
0022768459
-
Determination of thickness errors and boundary roughness from the measured performance of a multilayer coating
-
E. Spiller and A. Rosenbluth, “Determination of thickness errors and boundary roughness from the measured performance of a multilayer coating, ” Opt. Eng. 25, 954-963 (1986).
-
(1986)
Opt. Eng.
, vol.25
, pp. 954-963
-
-
Spiller, E.1
Rosenbluth, A.2
-
3
-
-
0025894334
-
Ion etching of thin W layers: Enhanced reflectivity of W-C multilayer coatings
-
E. J. Puik, M. J. van der Wiel, H. Zeijlemaker, and J. Verhoe-ven, “Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings, ” Appl. Surf. Sci. 47, 63-76 (1991).
-
(1991)
Appl. Surf. Sci.
, vol.47
, pp. 63-76
-
-
Puik, E.J.1
Van Der Wiel, M.J.2
Zeijlemaker, H.3
Verhoe-Ven, J.4
-
4
-
-
0012642571
-
Smooth multilayer films suitable for x-ray mirrors
-
R.-P. Haelbich, A. Segmuller, and E. Spiller, “Smooth multilayer films suitable for x-ray mirrors, ” Appl. Phys. Lett. 34, 184-186 (1979).
-
(1979)
Appl. Phys. Lett.
, vol.34
, pp. 184-186
-
-
Haelbich, R.-P.1
Segmuller, A.2
Spiller, E.3
-
5
-
-
0000736820
-
Sputtered layered synthetic microstructure (LSM) dispersion elements, AIP Conf
-
T. W. Barbee, “Sputtered layered synthetic microstructure (LSM) dispersion elements, ” AIP Conf. Proc. 75, 131-145(1981).
-
(1981)
Proc.
, vol.75
, pp. 131-145
-
-
Barbee, T.W.1
-
7
-
-
0027639238
-
Normal-incidence reflectance of W/B4C multilayer mirrors in the 34-50-Ä wavelength region
-
4C multilayer mirrors in the 34-50-Ä wavelength region, ” Appl. Opt. 32, 3541-3543 (1993).
-
(1993)
Appl. Opt.
, vol.32
, pp. 3541-3543
-
-
Seely, J.F.1
Gutman, G.2
Wood, J.3
Herman, G.S.4
Kowalski, M.P.5
Rife, J.C.6
Hunter, W.R.7
-
8
-
-
85010099074
-
-
paper presented at the Third International Conference on the Physics of X-Ray Multilayer Structures, Breckenridge, Colo., 3-7 March
-
J. Slaughter and C. Falco, “Extreme ultraviolet reflectance of thin films deposited in situ, ” paper presented at the Third International Conference on the Physics of X-Ray Multilayer Structures, Breckenridge, Colo., 3-7 March 1996; http://www.cxro.lbl.gov/multilayer/survey.html.
-
(1996)
Extreme Ultraviolet Reflectance of thin Films Deposited in Situ
-
-
Slaughter, J.1
Falco, C.2
-
9
-
-
84990623504
-
Structure and optical properties of multilayer x-ray mirrors for the longwave part (3.1-4.4 nm) of a water window
-
A. Fedorenko, V. Kondratenko, Yu. P. Pershin, O. Poltseva, E. Zubarev, L. Balakireva, V. Didyk, and V. Burtsev, “Structure and optical properties of multilayer x-ray mirrors for the longwave part (3.1-4.4 nm) of a water window, ” Cryst. Res. Tech-nol. 8, 1139-1147 (1994).
-
(1994)
Cryst. Res. Tech-Nol.
, vol.8
, pp. 1139-1147
-
-
Fedorenko, A.1
Kondratenko, V.2
Pershin, Y.P.3
Poltseva, O.4
Zubarev, E.5
Balakireva, L.6
Didyk, V.7
Burtsev, V.8
-
10
-
-
4244113719
-
Experimental multilayer survey in the VUV
-
P. Z. Takacs and T. W. Tonnessen, eds., Proc. SPIE 3152
-
F. Schaefers, H.-Ch. Mertins, M. Mertin, I. Packe, F. Schmolla, S. Di Fonzo, G. Soullie, W. Yark, H. Grimmer, P. Boni, D. Clemens, M. Horrisberger, N. N. Salashchenko, and E. A. Shamov, “Experimental multilayer survey in the VUV, ” in Materials, Manufacturing and Measurement for Synchrotron Radiation Mirrors, P. Z. Takacs and T. W. Tonnessen, eds., Proc. SPIE 3152, 222-230 (1997).
-
(1997)
Materials, Manufacturing and Measurement for Synchrotron Radiation Mirrors
, pp. 222-230
-
-
Schaefers, F.1
Mertins, H.-C.H.2
Mertin, M.3
Packe, I.4
Schmolla, F.5
Di Fonzo, S.6
Soullie, G.7
Yark, W.8
Grimmer, H.9
Boni, P.10
Clemens, D.11
Horrisberger, M.12
Salashchenko, N.N.13
-
11
-
-
0000733556
-
Cr/Sc multilayers for the soft x-ray range
-
F. Schaefers, H.-C. Mertins, F. Schmolla, I. Packe, N. Salashchenko, and E. Shamov, “Cr/Sc multilayers for the soft x-ray range, ” Appl. Opt. 37, 719-728 (1998).
-
(1998)
Appl. Opt.
, vol.37
, pp. 719-728
-
-
Schaefers, F.1
Mertins, H.-C.2
Schmolla, F.3
Packe, I.4
Salashchenko, N.5
Shamov, E.6
-
12
-
-
0022231696
-
Experience with the in situ monitor system for the fabrication of x-ray mirrors
-
G. Marshall, ed., Proc. SPIE 563
-
E. Spiller, “Experience with the in situ monitor system for the fabrication of x-ray mirrors, ” in Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, G. Marshall, ed., Proc. SPIE 563, 367-375 (1985).
-
(1985)
Applications of Thin Film Multilayered Structures to Figured X-Ray Optics
, pp. 367-375
-
-
Spiller, E.1
-
13
-
-
0000213399
-
Controlled fabrication of multilayer soft-x-ray mirrors
-
E. Spiller, A. Segmuller, J. Rife, and R.-P. Haelbich, “Controlled fabrication of multilayer soft-x-ray mirrors, ” Appl. Phys. Lett. 37, 1048-1050 (1980).
-
(1980)
Appl. Phys. Lett.
, vol.37
, pp. 1048-1050
-
-
Spiller, E.1
Segmuller, A.2
Rife, J.3
Haelbich, R.-P.4
-
14
-
-
0000011474
-
Smoothing of multilayer x-ray mirrors by ion polishing
-
E. Spiller, “Smoothing of multilayer x-ray mirrors by ion polishing, ” Appl. Phys. Lett. 23, 2293-2295 (1989).
-
(1989)
Appl. Phys. Lett.
, vol.23
, pp. 2293-2295
-
-
Spiller, E.1
-
15
-
-
0000841628
-
Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing
-
E. Spiller, “Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing, ” Opt. Eng. 6, 609-613 (1990).
-
(1990)
Opt. Eng.
, vol.6
, pp. 609-613
-
-
Spiller, E.1
-
16
-
-
0026140814
-
Ion bombardment of x-ray multilayer coatings: Comparison of ion etching and ion-assisted deposition
-
E. Puik, M. van der Wiel, H. Zeijlemaker, and J. Verhoeven, “Ion bombardment of x-ray multilayer coatings: comparison of ion etching and ion-assisted deposition, ” Appl. Surf. Sci. 251-260 (1991).
-
(1991)
Appl. Surf. Sci.
, pp. 251-260
-
-
Puik, E.1
Van Der Wiel, M.2
Zeijlemaker, H.3
Verhoeven, J.4
-
17
-
-
84912938040
-
Limits to ion beam etching of Mo/Si multilayer coatings
-
of 1992 OSA Technical Digest Series Optical Society of America, Washington, D.C
-
R. Schlatmann, C. Lu, J. Verhoeven, E. Puik, and M. van der Wiel, “Limits to ion beam etching of Mo/Si multilayer coatings, ” in Physics of X-Ray Multilayer Structures, Vol. 7 of 1992 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1992), p. PD6-1.
-
(1992)
Physics of X-Ray Multilayer Structures
, vol.7
-
-
Schlatmann, R.1
Lu, C.2
Verhoeven, J.3
Puik, E.4
Van Der Wiel, M.5
-
18
-
-
0029244915
-
High-precision soft x-ray reflectometer
-
D. Fuchs, M. Krumrey, P. Mueller, F. Scholze, and G. Ulm, “High-precision soft x-ray reflectometer, ” Rev. Sci. Instrum. 66, 2248-2250 (1995).
-
(1995)
Rev. Sci. Instrum
, vol.66
, pp. 2248-2250
-
-
Fuchs, D.1
Krumrey, M.2
Mueller, P.3
Scholze, F.4
Ulm, G.5
-
19
-
-
0025841511
-
Spectral diagnosis of a laser-produced XUV source using a digital camera system with pinhole transmission grating, Laser Part
-
N. Bowering, T. Dohring, U. Garner, and U. Heinzmann, “Spectral diagnosis of a laser-produced XUV source using a digital camera system with pinhole transmission grating, ” Laser Part. Beams 9, 593-601 (1991).
-
(1991)
Beams
, vol.9
, pp. 593-601
-
-
Bowering, N.1
Dohring, T.2
Garner, U.3
Heinzmann, U.4
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