Pt/TiN electrodes for stacked memory with polysilicon plug utilizing PZT films

Integrated Ferroelectrics

Volumn 13, Issue 1-3, 1996, Pages 113-119

  Kushida Abdelghafar, Keiko ^a   Hiratani, Masahiko ^a   Torii, Kazuyoshi ^a   Fujisaki, Yoshihisa ^a  

^a HITACHI LTD   (Japan)

Author keywords

Oxygen diffusion; Pt electrode; PZT; Stacked memory; TiN barrier metal

Indexed keywords

CRYSTALLIZATION; DIFFUSION IN GASES; ELECTRODES; FERROELECTRIC MATERIALS; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HEAT TREATMENT; LEAD COMPOUNDS; OXIDATION; PLATINUM; TITANIUM NITRIDE; TITANIUM OXIDES;

LEAD ZIRCONATE TITANATE; OXYGEN DIFFUSION; PLATINUM FILMS; STACKED MEMORY;

THIN FILMS;

EID: 0030350060     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589608013085     Document Type: Article

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