Bottom-ARC optimization methodology for 0.25 μm lithography and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 322-336

  Op De Beeck, Maaike ^a   Vandenberghe, Geert ^a   Jaenen, Patrick ^a   Zhang, Feng Hong ^a   Delvaux, Christie ^a   Richardson, Paul ^a   Van Puyenbroeck, Ilse ^a   Ronse, Kurt G ^a   Lamb III, James E ^b   Van Der Hilst, Johan B C ^c   Van Wingerden, Johannes ^d  

^a IMEC   (Belgium)

^b BREWER SCIENCE INC   (United States)

^c ASM Japan   (Japan)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

BARC; BARC etch; CD control; DUV lithography; Planarization; Process optimization; Substrate reflections; Topographical swing curves

Indexed keywords

DATA STORAGE EQUIPMENT; ENGINEERING GEOLOGY; LITHOGRAPHY; OPTIMIZATION; PRECISION ENGINEERING; PROCESS CONTROL; SUBSTRATES;

BARC; BARC ETCH; CD CONTROL; DUV LITHOGRAPHY; PLANARIZATION; PROCESS OPTIMIZATION; SUBSTRATE REFLECTIONS; TOPOGRAPHICAL SWING CURVES;

CURVE FITTING;

EID: 0000668641     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310762     Document Type: Conference Paper

References (7)

1. M. Op de Beeck et al., J. Photopolym. Sci. Technol., Vol.9, No.3, p.399, 1996
2. J. Sturtevant et al., Microlithography World, p. 13, Autumn 1995.
3. H. Dijkstra et al., Proc. of SPIE, Vol 1927, p. 275, 1993.
4. C. Bencher et al., Solid State Techn., p. 109, March 1997.
5. T. Ogawa et al., SPIE Vol. 2197, p. 722, 1994.
6. S. Dass et al., SPIE Vol. 3051, p. 405, 1997.
7. A. Schiltz et al., SPIE Vol. 3049, p. 386, 1997.