Strategies to improve linewidth control for 0.25μm and 0.18μm devices

Journal of Photopolymer Science and Technology

Volumn 9, Issue 3, 1996, Pages 399-424

  De Beeck, Maaike Op ^a   Ronse, Kurt ^a   Goethals, Mieke ^a   Vandenberghe, Geert ^a   Bruggeman, Bert ^a   Van Hove, Luc Den ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005014468     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.399     Document Type: Article

References (13)

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9. Information given by Brewer Science
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13. Kurt Ronse et al, Proc. ofSPIE, Vol. 2726, (1996) to be published.