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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 293-298

Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers

(10) Voorma, H J a Louis, E a Koster, N B a Bijkerk, F a Zijlstra, T b De Groot, L E M b Rousseeuw, B A C b Romijn, J b Van Der Drift, E W J M b Friedrich, J c

a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN (Netherlands)

b DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

c UNIVERSITY OF HAMBURG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000607982 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.589309 Document Type: Article

Times cited : (4)

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