A combined objective lens for electrons and ions

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 427-430

  De Jager, P W H ^a   Kelder, M C W ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; CALCULATIONS; ELECTRIC FIELDS; ELECTRON BEAMS; FOCUSING; GEOMETRICAL OPTICS; ION BEAMS; MAGNETIC FIELDS; NANOTECHNOLOGY; PARTICLE OPTICS;

ABERRATION COEFFICIENTS; EROSION EFFECT; OBJECTIVE LENS;

LENSES;

EID: 0029769442     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00279-0     Document Type: Article

References (7)

1. K.H. Herrmann, Detection systems, in: J.N. Chapman and A.J. Craven, Quantitative electron microscopy, The Scottish Universities Summer School in Physics (1984), pp. 119-139.
2. P.W.H. de Jager and P. Kruit, Applicability of focused ion beams for nanotechnology, Microelectronic Engineering 27 (1995), pp. 327-330.
3. J.E. Barth and P. Kruit, Addition of different contributions to the charged particle probe size, to be published in Optik.
4. J.R.A. Cleaver and H. Ahmed, A combined electron and ion beam lithography system, J. Vac. Sci. Technol. B3(1), Jan/Feb 1985, pp. 144-147.
5. H.W.G. van der Steen, program package for the optimization of electrostatic lenses, licensed by Delft Particle Optics Foundation, 1992.
6. B. Lencová and G. Wisselink, Electrostatic Lens Design program package, licensed by Delft Particle Optics Foundation, 1992.
7. B. Lencová and G. Wisselink, Magnetic Lens Design program package, licensed by Delft Particle Optics Foundation, 1992.