Properties of hydrogenated amorphous silicon thin film transistors fabricated at 150°C

Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 1315-1319

  Choi, Jae Beom ^a   Yun, Duk Chul ^a   Park, Yong In ^a   Kim, Jeong Hyun ^a  

^a LG Display Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000574573     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00943-6     Document Type: Article

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