Self-limiting process for the bismuth content in molecular beam epitaxial growth of Bi2Sr2CuOy thin films

Applied Physics Letters

Volumn 71, Issue 25, 1997, Pages 3712-3714

  Migita, Shinji ^a   Kasai, Yuji ^a   Ota, Hiroyuki ^a   Sakai, Shigeki ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; BISMUTH COMPOUNDS; CRYSTAL STRUCTURE; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; SUPERCONDUCTING FILMS; X RAY DIFFRACTION ANALYSIS;

ATOMIC ABSORPTION SPECTROSCOPY; OZONE MOLECULAR BEAM; STICKING COEFFICIENTS;

HIGH TEMPERATURE SUPERCONDUCTORS;

EID: 0031357201     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120490     Document Type: Article

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